Head of the Laboraotoy: Dr. George Levi. Office: +972-3-640-9205. Email: This email address is being protected from spambots. You need JavaScript enabled to view it.

The goal of our TEM Lab is to provide microstructural, morphological and chemical analysis down to sub-nanometer spatial resolution for a wide range of inorganic and organic materials and compounds.

The laboratory is currently endowed with two field emission gun TEM-s. Besides, the specimens and holders are cleaned prior to the TEM experiments using an advanced plasma cleaner system to minimize contamination induced artefacts. The required electron-transparency of the specimens is achieved by various methods, some of which are applicable in our Sample Preparation Lab.

In addition to service by the Lab dedicated experts, students and researchers meeting the requirements set by a basic, practical training course, may qualify to operate the microscopes and plasma cleaner by themselves. For further information please, contact the Lab Manager.

FEI™ F20 Philips-Tecnai TEM

·         Routinely operated at 200 kV and 80 kV.

·         STWIN objective lens, allowing for relatively large tilting angles

·         Main characteristics at 200 kV

o   Cs=1.2 mm (spherical aberration coefficient)

o   Point-to-point resolution of 0.24 nm

o   Information limit of 0.1 nm

·         EDAX™ energy dispersive spectrometer for chemical analysis (classical SiLi detector, collection angle 0.09 sterad)

·         Lorenz lens enabling for in situ studies of magnetic materials

·         OneView Gatan™ 16 Megapixels CMOS camera with in situ drift correction, 25 frames per second at full resolution and a dynamic range way beyond classical CCDs

·         Dedicated specimen holders:

o   Low background double tilt Gatan analytical holder (with Faraday cup)

o   Liquid nitrogen cooled single tilt Gatan analytical holder (also low background)

o   Heating single tilt holder, designed to reach 1300 degC

image001 FEI™ F20 Philips-Tecnai TEM

 

JEOL™ JEM-2010F FEG-STEM – installation in due progress

·         Routinely operated at 200 kV and 80 kV

·         Scanning electron microscopy module (STEM)

·         UHR objective pole piece for enhanced resolution imaging

·         Main characteristics at 200 kV

o   Cs=0.5 mm (spherical aberration coefficient)

o   Point-to-point resolution of 0.19 nm

o   Information limit of 0.1 nm

·         ThermoNoran™ energy dispersive spectrometer for chemical analysis with an energy resolution of ~133 eV (classical SiLi detector, enhanced collection angle ~0.13 sterad, take-off angle ~20 deg)

·         Tridiem Gatan™ electron energy loss spectrometer for chemical analysis with an energy resolution of ~1 eV or less.

·         JEOL Bi-Prism for electron holographic measurements with a phase resolution of ~100 mrad at medium and low magnifications

·         Dedicated specimen holders

o   Low background double tilt JEOL analytical holders

image004 JEOL™ JEM-2010F FEG-STEM

 

Solarus 950 Gatan™ Advanced Plasma System – installation in due progress

·         Chemistry used to generate plasma: Hydrogen/Oxygen or Argon/Oxygen combinations

·         The manufacturer provides cleaning recipes developed to maximize contamination removal rates while minimizing damage to TEM samples, including holey carbon films

·         Large degree of flexibility, allowing for custom recipes programming

·          

image006 Solarus 950 Gatan™ Advanced Plasma System